Material Compatibility with Common Chemistries

Over the many years of operations Imtec has gained the knowledge and know how to meet the material needs of many industries including the semiconductor industry. With this vast knowledge Imtec has compiled the table seen below. On this table is a list of processes common to the semiconductor industry and many other industries. Listed aside these process names are the chemistry makeups, applications, and most importantly the product or materials to be used with these processes.

For more information regarding process chemistry, applications, materials, or general know how please contact Imtec Acculine and ask for a product specialist. Please call +1-510-770-1800 or contact us via email.

Click the link to view the table in PDF file format.

Process Name Chemistry Application Process Tank

Si Iso Etch 

HNO3+H2O+NH4F 

Etch Silicon

PFA Tank (near ambient)
Oxide Etch

10:1 HF (H2O+49% HF) Etch Silicon Dioxide  PFA Tank with heat exchange coils
Buffered Oxide Etch

5:1 (40% NH4F+49% HF) Silicon Dioxide PFA Tank with heat exchange coils
Quickdump Rinse

H2O chemical removal PVDF Quickdump
Post Hot Phos Rinse

H2O Acid Rinse PVDF Quickdump Megasonic
Post Piranha Rinse

H2O Acid rinse, Sulfate removal PVDF Quickdump Megasonic
SC-2, HPM, RCA2, Huang B

HCL+H2O2+H2O Metals removal, alkalis and metal hydroxide removal Quartz recirculated Megasonic
SC-1, APM,RCA1, Huang A

NH4OH+H202+H2O Particle removal, light organics removal, protective oxide regrowth Quartz recirculated Megasonic
EDP

NH2(CH2)2NH2+C6H4(OH)+H20 Anisotropic Silicon Etch Quartz static or recirculated
TMAH

TMAH Anisotropic Silicon Etch Quartz static or recirculated
Cu FeCl3 200

Copper etchant type CE-200 from Transene (30% FeCl3 + 3-4% HCl + H2O) Etch Copper Quartz static or recirculated
Cu APS 100

Copper etchant APS 100 from Transene (15-20% (NH4)2S2O8 + H2O) Etch Copper Quartz static or recirculated
NiCr TFN

Nichrome etchant TFN from Transene (10-20% (NH4)2Ce(NO3)6) + 5-6% HNO3 + H2O) Etch NiCr Quartz static or recirculated
Al Etch A

Al Etchant Type A from Transene (80% H3PO4 + 5% HNO3 + 5% HAc +10%H2O) Etch Aluminum Quartz static or recirculated
CR-14

Chromium etchant CR-14 from Cyantek (22% (NH4) 2Ce(NO3)6) + 8% HAc+ H2O) Etch Chromium Quartz static or recirculated
CR-7

Chromium etchant CR-7 from Cyantek (9% (NH 4)2Ce(NO3)6) + 6% HClO4 + H2O) Etch Chromium Quartz static or recirculated
Aqua regia

HCl+HNO3 Etch Gold Quartz static or recirculated
AU-5

Gold etchant AU-5 from Cyantek (5% I2 +10% KI + 85% H2O) Etch Gold Quartz static or recirculated
Moly Etch

Molybdenum etchant (180 H3PO4 : 11 HAc : 11 HNO3 : 150 H2O) Etch Molybdenum Quartz static or recirculated
Aqua regia, Dilute

Dilute aqua regia (3 HCl : 1 HNO3 : 2 H2O), ~30ºC Etch Noble metals Quartz static or recirculated
Phos+Sulf

1 H2SO4 : 1 H3PO4 Etch Sapphire Quartz static or recirculated
Pad Etch 4

Pad Etch 4 from Ashland (13% NH 4F + 32% HAc + 49% H2O + 6% propylene glycol + surfactant) Etch SiO2, not Al Quartz static or recirculated
Ti Etch

Titanium wet etchant (20 H2O : 1 H2O2 : 1 HF) Etch Titanium Quartz static or recirculated
H2O2 50ºC

Hydrogen peroxide (30wt% H2O2, 70wt% H2O) Etch Tungsten Quartz static or recirculated
SA-80

(NH4)SO4+H2SO4 Organics removal Quartz static or recirculated
SOM, Sulfuric/Ozone mix

H2SO4+O3 Organics removal Quartz static or recirculated
DIO3, Ozinated water

DIH2O+O3 Organics removal, protective SiO2 regrowth Quartz static or recirculated
Microstrip

Microstrip 2001 photoresist stripper, 85ºC Photoresist Strip Quartz static or recirculated
Piranha, SPM

Piranha (~50 H2SO4 : 1 H2O2) Resist strip, Post-ash residue removal, organic removal Quartz static or recirculated
Phosphoric

Phosphoric Acid (85% by weight) Etch Silicon nitride Quartz static or recirculated           Dedicated Nitride Etch System
Proprietary Solvent Resist Strippers
Various Solvents Remove Photoresist Quartz Static or recirculated
Stainless Steel (static or recirculated)
IPA

Isopropanol Cleaning Stainless Steel static or recirculated
Methanol

Methanol Cleaning Stainless Steel static or recirculated
Acetone

Acetone Photoresist Strip Stainless Steel static or recirculated
Anisotropic Etch

KOH (30% by weight) Anisotropic SiliconEtch PFA Tank with In-Line Heater