The ACCUDRY uses the difference between the surface tension of deionized water and isopropyl alcohol (IPA) vapor to produce a gradient that generates fast and effective drying of substrates. Also know as an IPA Dryer.

• Surface tension ipa vapor drying yields substrates that are spotless and watermark-free.

• The Accudry has been designed for ease-of-use, operating the IPA vapor dryer is as simple as load, set, run.

• With no moving parts and  no mechanical stresses, the elimination of spin drying dramatically reduces wafer breakage as seen in spin rinser dryers.

When integrated with cleaning and rinsing, this patented tool can provide an environmentally friendly process for drying wafers, silicon, ICs, solar cells, fuel cells, MEMS, disk drives, and much more. The vapor dryer can process a variety of substrate types and sizes in numerous batch configurations. The Accudry can be produced as a stand alone unit or integrated into a wet processing station.